Wim Ubachs

Wim Ubachs serves as a Researcher at the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam, The Netherlands, within the EUV Plasma Processes research group. His work focuses on fundamental plasma processes essential for extreme ultraviolet (EUV) light generation in semiconductor lithography systems.

His research spans critical areas of nanofabrication technology:

• Plasma Physics
• Nanolithography
• Semiconductor Manufacturing
• Extreme Ultraviolet Light Sources
• Plasma Diagnostics
• Laser-Produced Plasmas

These fields address core challenges in advancing EUV-based chip manufacturing for next-generation semiconductor devices.

As part of ARCNL's EUV Plasma Processes team led by Oscar Versolato, Dr. Ubachs collaborates with industry partners including ASML to optimize plasma-based light sources for high-volume manufacturing, contributing to the continued scaling of integrated circuits through fundamental plasma research.