Mikheil Kharbedia

Mikheil Kharbedia is a Postdoctoral Researcher at the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam, affiliated with the Source Department's EUV Plasma Processes group led by Prof. Oscar Versolato. His work focuses on laser-induced deformation of tin droplets and hydrodynamic instabilities in thin sheets for extreme ultraviolet lithography applications.

He earned a Bachelor's degree in Chemistry (2016) and Master's degree in Chemical Science and Technology (2017) from the University of Madrid, followed by a Ph.D. (2020) investigating rheology and surface wave turbulence of complex fluids.

Prior to ARCNL, he served as a research fellow at ELI-ALPS developing micro-sized liquid jets for ultrafast laser spectroscopy, including a collaborative research stay at LMU. His interdisciplinary research bridges Plasma Physics, Fluid Dynamics, and Laser Spectroscopy to advance semiconductor manufacturing techniques.