Hugo França

Hugo França is a Research Fellow at the University of Amsterdam (UvA) and a member of the EUV Plasma Processes group at the Advanced Research Center for Nanolithography (ARCNL). He holds a PhD in Computer Science and Computational Mathematics from the University of São Paulo (USP), earned in 2023 after a collaborative year at UvA as a visiting student.

• Education:
  • Bachelor's in Computer Science and Computational Mathematics, State University of São Paulo (2015)
  • Master's in Computer Science and Computational Mathematics, State University of São Paulo (2018)
  • PhD in Computer Science and Computational Mathematics, University of São Paulo (2023)

Research Interests: Hugo focuses on computational modeling of fluid dynamics, particularly numerical simulations of non-Newtonian droplets. His current work at ARCNL involves studying laser-induced deformation of tin droplets for EUV lithography applications, while continuing droplet flow research at UvA's FluidLab group.

• Supervision:
  • PhD advisors: Prof. Dr. Cassio Oishi (USP) and Prof. Dr. Maziyar Jalaal (UvA)
  • Current collaboration: FluidLab group led by Maziyar Jalaal (UvA) and Oscar Versolato's EUV Plasma Processes group (ARCNL)