Oscar Versolato

Oscar Versolato is a Research Professor and Group Leader of the EUV Plasma Processes group at the Amsterdam Center for Nanolithography (ARCNL). He leads the Source Department, focusing on advanced plasma-based EUV light sources for semiconductor applications. His expertise spans plasma physics, laser technology, and spectroscopy of highly charged ions.
He holds a PhD cum laude from the University of Groningen (2016 NWO Vidi Grant recipient) and conducted postdoctoral research at the Max Planck Institute and Aarhus University. His work addresses tin plasma dynamics, droplet deformation, and EUV radiation generation.
Key achievements include ERC Starting (2018) and ERC Consolidator (2022) grants. Research interests include optimizing EUV sources via laser-driven tin plasmas and understanding plasma kinetics.

Education:

• PhD in Laser Spectroscopy (University of Groningen)

Research Focus:

• EUV plasma dynamics and optimization
• Laser-driven tin microdroplet systems
• Spectroscopic analysis of high-charge-state ions
• Plasma source efficiency and scalability

Awards:

• NWO Vidi Research Grant (2016)
• ERC Starting Grant (2018)
• ERC Consolidator Grant (2022)

Grants & Projects: Leadership in EUV source development, including the TI-REX tunable infrared laser system for nanolithography applications.

Labs/Teams: Head of ARCNL's Source Department, coordinating interdisciplinary efforts in plasma physics and nanolithography.