John Sheil

John Sheil is a Group Leader at the Advanced Research Center for Nanolithography (ARCNL) and an Assistant Professor at Vrije Universiteit Amsterdam. He leads the Plasma Theory and Modeling group, specializing in laser-driven plasma processes for EUV lithography. His work focuses on simulating tin plasma dynamics to optimize EUV light generation for advanced semiconductor manufacturing. He holds a BSc (2015) and PhD (2019) in Theoretical Physics from University College Dublin, where his doctoral research re-evaluated actinide ion configurations using plasma spectroscopy and atomic theory.

At ARCNL, he collaborates closely with experimentalists to model EUV source plasmas, emphasizing radiation transport and plasma expansion. His research bridges fundamental plasma physics with industrial applications, supported by a 2023 Veni Grant. He mentors early-career researchers through mandatory training programs and fosters interdisciplinary collaboration via ARCNL’s cohesive research environment. His group’s current projects include modeling CO₂- and 2μm-laser-driven tin plasmas to enhance EUV emission efficiency.

• Education:
• BSc Theoretical Physics, University College Dublin (2015)
• PhD Spectroscopy & Atomic Theory, University College Dublin (2019)

His research interests span plasma kinetics, laser-plasma interactions, and EUV source optimization. He actively participates in ARCNL’s poster sessions and international collaborations, driving innovation in nanolithography technology.