Ronnie Hoekstra

Ronnie Hoekstra is a Researcher and Group Leader of the Ion Interactions group at ARCNL (Amsterdam Research Center for Nanolithography). His work focuses on advanced materials and plasma processes critical to EUV lithography and nanoscale metrology. He is affiliated with the Amsterdam Science Park, contributing to interdisciplinary research at the intersection of physics and nanotechnology.

Research interests include ion-beam interactions with materials, plasma-based fabrication techniques, and metrology solutions for next-generation semiconductor manufacturing. His group collaborates closely with other departments such as EUV Plasma Processes and Metrology, addressing challenges in extreme ultraviolet (EUV) lithography and nanoscale imaging.

ARCNL’s mission aligns with his research, aiming to bridge fundamental science and industrial applications in nanotechnology. While no specific awards or grants are listed, his role at this research center underscores his active contribution to cutting-edge materials and plasma science.