Kjeld Eikema

Kjeld Eikema is a Researcher and Group Leader of the EUV Plasma Processes department at ARCNL (Amsterdam Research Center Netherlands). His work focuses on advanced plasma-based technologies, particularly in the context of extreme ultraviolet (EUV) light generation and plasma process modeling. He collaborates with interdisciplinary teams across ARCNL's research divisions, including Plasma Theory and Modeling, Ion Interactions, and Computational Imaging.

ARCNL's mission involves advancing fundamental and applied research in plasma physics, materials science, and nanoscale imaging. Eikema’s group specializes in understanding plasma dynamics for EUV applications, with implications for semiconductor manufacturing and precision metrology. His research leverages cutting-edge experimental setups and computational tools to address challenges in high-intensity laser-plasma interactions.

Contact details: Email | ARC-NL Website