Takahiro Kozawa

Takahiro Kozawa is a Professor at the Institute of Scientific and Industrial Research, Osaka University, leading the Beam Materials Science department. His research focuses on quantum beam materials science, particularly in EUV lithography for semiconductor manufacturing, nanofabrication, and machine learning applications for materials design.

• Osaka University - Institute of Scientific and Industrial Research
• Beam Materials Science Department

Research Interests include:

• Elucidating chemical reactions induced by quantum beams under extreme conditions (nanoscale, high-temperature/pressure)
• Development of nanofabricated materials for EUV lithography in semiconductor manufacturing
• Investigation of stochastic defect mechanisms in photolithography
• Machine learning for defect shape analysis and resist material optimization
• Exploration of radiation chemistry in extreme ultraviolet regions and supercritical environments

Recent Publications demonstrate his focus on EUV lithography challenges, resist material chemistry, and quantum beam interactions at nanoscales. His work aims to address carbon neutrality through reduced semiconductor power consumption.

Collaborations include researchers like Yusa Muroya, Kazumasa Okamoto, and Yuko Ito. The Kozawa Lab develops novel reaction systems for semiconductor applications while investigating fundamental radiation-induced processes in materials.