Sascha Brose

Dr. Sascha Brose is a researcher at the Chair of Technology of Optical Systems (TOS) at RWTH Aachen University, based at the Fraunhofer Institute for Laser Technology (ILT) in Aachen, Germany. His work focuses on advanced optical metrology and extreme ultraviolet (EUV) technology for semiconductor manufacturing and nanofabrication, with institutional affiliation spanning both academic and industrial research environments.

His research spans optical systems, computational optics, and EUV technology with emphasis on metrology for thin films and nanostructured surfaces, lithography optimization, and spectroscopic characterization. He develops instrumentation for high-precision nanoscale fabrication and characterization, addressing critical challenges in semiconductor manufacturing and quantum technology applications through experimental and computational approaches.

Recent publications (2022-2025) reveal a concentrated focus on EUV lithography and metrology, particularly compact stand-alone systems for photomask inspection, nanoscale grating characterization, and latent image analysis. Key trends include Talbot lithography optimization, stochastic roughness modeling, transition from synchrotron-based to laboratory EUV instruments, and novel metrology solutions for 3nm semiconductor nodes.

As part of the Fraunhofer ILT and RWTH Aachen collaboration, Dr. Brose works within a multidisciplinary team developing next-generation optical systems for industrial applications, maintaining strong ties with semiconductor manufacturers through joint research projects and technology transfer initiatives.