معرفی
Marko Vehkamäki is a University Researcher at the Department of Chemistry, University of Helsinki. He specializes in advanced material deposition and etching technologies, particularly focusing on atomic layer deposition (ALD) and related processes. His research interests include chemical sciences, nanotechnology, and semiconductor materials. He is actively involved in the HelsinkiALD research infrastructure, contributing to equipment operation and material synthesis projects.
As a supervisor in the Doctoral Programme in Materials Research and Nanosciences, he mentors PhD candidates in cutting-edge materials research. His work bridges fundamental chemistry with applied technologies, such as sensor fabrication via 3D printing and novel semiconductor etching techniques.
Key contributions include advancements in oxide etching methodologies, boron-doped dielectric films, and area-selective deposition of ZnS materials. His research is supported by collaborations within the HelsinkiALD facility, emphasizing interdisciplinary approaches to material science challenges.
