معرفی
Mikko Ritala is a Professor at the University of Helsinki's Department of Chemistry. His research focuses on atomic layer deposition (ALD), thin film materials, and catalytic processes. He leads the HelsinkiALD research infrastructure and has been a project manager for initiatives like the Intel-Ritala 2023-2026 corporate-funded project. Ritala has received the Alfred Kordelin Foundation Award (2010) for his contributions to materials science. His work spans interdisciplinary areas including energy materials, biomedical coatings, and environmental applications of advanced materials.
Key research interests include developing novel ALD processes for functional thin films, optimizing photocurrent responses in energy systems, and exploring catalytic etching techniques. He actively collaborates internationally and organizes conferences such as the Materials for Advanced Metallization Conference (MAM2025) and the International Conference on Atomic Layer Deposition (ALD 2024).
Ritala's research group has published extensively (>625 outputs) on topics like ALD-grown oxides, carbides, and fluorides, as well as applications in photovoltaics and environmental engineering. The HelsinkiALD laboratory under his leadership serves as a hub for ALD innovation and industrial partnerships.
