معرفی
Matti Putkonen is a Professor at the Department of Chemistry, University of Helsinki, leading research in Atomic Layer Deposition (ALD) and materials science. He manages the HelsinkiALD research infrastructure and oversees the Doctoral Programme in Materials Research and Nanosciences. His work focuses on thin film synthesis, catalytic materials, and ALD process optimization.
Research interests include ALD mechanisms for novel materials like molybdenum oxides, carbides, and photoanodes. He explores applications in energy storage, catalysis, and surface engineering. Over 127 publications highlight contributions to thin film characterization, material durability, and ALD-based solutions for environmental and electronic systems.
He leads the JAES-2024 project (€784k), investigating advanced ALD processes for functional materials. His research integrates experimental and theoretical approaches, emphasizing sustainable and high-performance materials. The HelsinkiALD lab supports cutting-edge studies in ALD for diverse applications, from nanotechnology to energy systems.