معرفی
Mykhailo Chundak is a Research Fellow in the Department of Chemistry at the University of Helsinki. His work focuses on advanced materials engineering, physical sciences, and nanotechnology, particularly in thin film synthesis and surface characterization.
Education:
- PhD in Surface and Interface Physics, Charles University in Prague (2015)
- JSPS Postdoctoral Fellowship at National Institute for Materials Science (2015–2017)
- Postdoctoral Researcher at Catholic University of Louvain (2019)
Research Interests: Chundak specializes in atomic layer deposition (ALD), thin film materials, and catalytic systems. His work bridges nanotechnology with energy applications, exploring novel materials for photocatalysis, hydrogen evolution, and advanced etching techniques.
Key Projects:
- Leading participant in the JAES-funded project "JAES-1/2024-12/2027-Putkonen" (2024–2027)
Awards:
- JSPS Postdoctoral Fellowship (2015–2017)
- Postdoctoral Research Award at Catholic University of Louvain (2019)
Publications Trends: Recent work emphasizes ALD-derived materials (e.g., molybdenum oxides, Ti-Fe oxides) and their applications in energy storage/conversion systems. Collaborations span catalytic hydrogenolysis, photocurrent optimization, and nanoscale etching processes.