Harm Knoops

Harm Knoops is a part-time Assistant Professor in the Department of Applied Physics, Plasma & Materials Processing at Eindhoven University of Technology (TU/e). Additionally, he serves as an Atomic Scale Segment Specialist for Oxford Instruments Plasma Technology (OIPT), maintaining a dual role that bridges academic research with industrial applications in atomic scale processing.

Education:

• PhD in Applied Physics at Eindhoven University of Technology (2011)
• Thesis: "Atomic Layer Deposition: From Reaction Mechanisms to 3D-integrated Micro-batteries"
• Work visit to Argonne National Labs (USA) during PhD studies

Knoops' research focuses on plasma-based synthesis of thin films and atomic layer deposition (ALD) processes. His primary expertise lies in understanding and developing plasma ALD, where he has made significant contributions to RF substrate biasing techniques and the growth of 2D materials like MoS₂. His work on redeposition effects in silicon nitride ALD has provided critical insights for semiconductor manufacturing. Knoops' research uniquely combines fundamental understanding of plasma processes with industrial relevance, addressing challenges in both academic and commercial settings.

Analysis of his publication record reveals a strong focus on the physical mechanisms underlying plasma-assisted ALD processes across multiple application areas. His work spans semiconductor technology (particularly silicon nitride deposition for transistors), energy storage (nanostructured Li-ion batteries), and advanced materials synthesis (2D materials). The consistent theme is investigating surface reactions, film growth mechanisms, and process optimization in atomic-scale deposition techniques, with emphasis on conformality in high aspect ratio structures and process diagnostics.

Harm Knoops has published 40 peer-reviewed papers with 9 as first author (including one review paper), achieving an H-index of 22 and accumulating 1,126 citations according to Web of Science. His research has been well-received by the scientific community, with several publications receiving significant attention in the field of atomic layer deposition and plasma processing.

While working at Oxford Instruments Plasma Technology since 2014, Knoops has focused on advancing deposition techniques and deepening the understanding of ALD processes, particularly for nitrides. His industry position complements his academic role, allowing him to translate fundamental research into practical applications. At TU/e, he contributes to educational activities in "Plasma processing science and technology," sharing his expertise with students and researchers.

Knoops is affiliated with multiple research groups including the Center for Quantum Materials and Technology Eindhoven, the Atomic Scale Processing group, and the Plasma & Materials Processing group. These affiliations reflect the interdisciplinary nature of his work, which spans materials science, plasma physics, and semiconductor processing, connecting fundamental research with industrial applications in nanofabrication.