Adrie Mackus

Adrie Mackus is an Associate Professor in the Plasma and Materials Processing group at the Department of Applied Physics and Science Education, Eindhoven University of Technology (TU/e). He earned his M.Sc. and Ph.D. in Applied Physics from TU/e (2009 and 2013, respectively) and conducted postdoctoral research at Stanford University (2014–2016). His research focuses on atomic layer deposition (ALD) and atomic layer etching (ALE) for nanoelectronics, emphasizing selective processing and bottom-up fabrication. He has secured significant grants, including an NWO VIDI and ERC Starting Grant, and chairs the 2017 Area Selective Deposition workshop. His work combines industrial collaborations with fundamental studies using in-situ techniques.

**Education & Academic Background:**
- M.Sc. and Ph.D. in Applied Physics (TU/e, 2009 & 2013)
- Postdoctoral Fellowship at Stanford University (2014–2016)
- Tenured as Associate Professor at TU/e in 2019

**Research Interests:**
- Selective ALD/ALE for nanoelectronics
- Plasma-based thin film processing
- Surface chemistry and material synthesis
- Bottom-up fabrication techniques
- Industrial applications and fundamental mechanism studies

**Awards & Grants:**
- ERC Starting Grant (2020)
- NWO VIDI Grant (2020)
- Paul H. Holloway Award (2019)
- Chair of ASD2017 Workshop

**Teaching & Activities:**
- Teaches courses like *Variables, Dimensions and Dynamics* and *Plasma Processing Science*
- Vicevoorzitter of the Nederlandse Vacuümvereniging (NEVAC)
- Supervises projects on ALD/ALE and nanofabrication

**Labs & Collaborations:**
- Leads the Selective Atomic-Scale Processing group
- Collaborates with industry partners on applied projects
- Active in developing advanced deposition/etching tools