Joost F.W. Maas

Joost F.W. Maas is a Doctoral Candidate at the Eindhoven University of Technology, affiliated with the Plasma & Materials Processing group under the Department of Applied Physics. His research focuses on atomic layer deposition (ALD), surface chemistry, and computational modeling of nanoscale material processing.

Key research themes include:

• Understanding Atomic Layer Etching (ALE) mechanisms for Al2O3 using plasma and chemical precursors
• Simulating precursor blocking in area-selective ALD with small-molecule inhibitors
• Modeling adsorption kinetics and spatial distribution of molecules on surfaces

His publications highlight interdisciplinary approaches combining materials science, chemical engineering, and computational physics, with a focus on improving thin film deposition techniques. Notable collaborations include researchers like Dr. I. Tezsevin and Prof. A.J.M. Mackus.

Joost has contributed datasets to open-access repositories (4TU.Centre for Research Data) and received media coverage (Eindhoven University of Technology, 2023) for his work on ALD molecular inhibition.