Adrie J.M. Mackus

Adrie J.M. Mackus is an Associate Professor in the Applied Physics department at Eindhoven University of Technology (TU/e), specializing in Plasma & Materials Processing. He leads research on thin film deposition/etching for nanoelectronics, focusing on selective atomic-scale processing. His work combines industrial applications with fundamental studies using in-situ techniques.

Education: M.Sc. and Ph.D. (both summa cum laude) in Applied Physics from TU/e (2009/2013). Postdoc at Stanford University's Chemical Engineering department (2014-2016). Tenured at TU/e since 2019.

Research Interests: Atomic Layer Deposition (ALD), Atomic Layer Etching (ALE), selective processing mechanisms, and bottom-up nanoelectronics fabrication. His projects include industrial collaborations and EU-funded initiatives like the ERC Starting Grant (2020) and NWO VIDI Grant (2020).

Key Projects (2023-2029): ASPEA (Atomic-Scale Processing Equipment for Ångström Era) and ESPRO (2D materials patterning via EUV/Area-Selective Processing).

Awards: Paul H. Holloway Award (2019), ERC Starting Grant (2020), NWO VIDI Grant (2020). Active in organizing workshops like ASD2017 (Area Selective Deposition).

Teaching: Courses include 'Plasma Processing Science & Technology' and 'Variables, Dimensions & Dynamics: Order and Chaos in Physics'.