معرفی
A.Y. Kovalgin is an Associate Professor at the University of Twente in the Faculty of Electrical Engineering, Mathematics and Computer Science (EEMCS), affiliated with the Electrical Engineering department and the MESA+ Institute. His career spans over two decades at the University of Twente, transitioning from post-doctoral researcher to his current role.
- MSc in Physics (molecular spectroscopy), St.-Petersburg State University (1988)
- PhD in Electronic Materials Technology (1995)
His research focuses on advanced thin-film deposition techniques and their applications in semiconductor devices:
- Chemical/Plasma Enhanced CVD for GexSi1-x films
- Atomic Layer Deposition (ALD) of aluminum/gallium nitride and metallic films
- 2D materials like silicene and graphene
- Electrical properties of ultra-thin metallic films
- Low-temperature CMOS-compatible processes
- Hot-surface silicon devices for sensors/micro-reactors
Contact: a.y.kovalgin@utwente.nl
حوزههای پژوهشی
Chemical Vapor Deposition (CVD)Plasma Enhanced CVDAtomic Layer Deposition (ALD)Plasma Enhanced ALDHot-wire ALD2D Materials (silicene, graphene)Ultra-thin FilmsMetal-to-Semiconductor JunctionsLow-Temperature Semiconductor FabricationCMOS Post-processingContact Resistance ModelingLow-Power Silicon Devices
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