معرفی
Wu MEng is a Researcher at the University of Twente, affiliated with both the Faculty of Electrical Engineering, Mathematics and Computer Science (EEMCS) and the Faculty of Science and Technology (TNW). He is currently pursuing his PhD within the interdisciplinary project X-tools, focusing on Atomic Layer Deposition (ALD)-based thin films for XUV optics, under the supervision of dr. Alexey Y. Kovalgin, dr. Robbert W. E. van de Kruijs, and prof. dr. Jurriaan Schmitz.
Education
- Bachelor degree in Polymer Science and Engineering from Nanjing University of Science and Technology (2011-2015)
- Master degree in Materials Science from Shanghai University and Ningbo Institute of Materials Technology & Engineering (2015-2018)
Research Focus
Wu MEng's expertise centers on thin film growth techniques, particularly Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), with applications in XUV optics and dielectric materials. His work contributes to advancements in extreme ultraviolet (XUV) optical systems through precise film thickness control and material characterization.
Professional Experience
- 2021–Present: PhD candidate in the X-tools project at the University of Twente
- 2018–2021: Process engineer at TCL CSOT, specializing in oxide-based thin film transistors
Organizational Affiliations
- Integrated Devices and Systems (IDS) group within EEMCS-EE
- XUV Optics group under the Nano Electronic Materials (TNW-NEM) specialization
