معرفی
Roland Levy is a Professor at the New Jersey Institute of Technology (NJIT), specializing in advanced materials science and chemical vapor deposition (CVD) technologies. His research focuses on thin films, semiconductor materials, and corrosion protection, with notable contributions to CVD processes for coatings and ultra-thin silicon wafer development.
Levy has led multiple federally funded projects, including instrumentation for ultra-thin silicon wafers and boron nitride masks for X-ray lithography. His work bridges fundamental materials science with engineering applications, emphasizing environmental and industrial material solutions.
- Notable Projects:
- Acquisition of Instrumentation for Research and Development of Bonded Ultra Thin Silicon Wafers (NSF, 1996–1998)
- Synthesis and Characterization of Boron Nitride Masks for X-Ray Lithography (NSF, 1990–1992)
His research interests encompass plasma-assisted CVD, material corrosion protection, and semiconductor interfaces. Over 40 years of publications highlight advancements in thin films, with key contributions to tantalum deposition, aluminum coatings, and smart window technologies.
Levy’s work has been funded by the National Science Foundation (NSF), and his publications span journals like Solar Energy and Thin Solid Films.
