Zhonghui Nie

Zhonghui Nie is a researcher at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands, specializing in ultrafast spectroscopy and extreme ultraviolet (EUV) science. His work bridges experimental physics and nanoscale metrology, with a focus on developing table-top soft X-ray sources for applications in the water window spectral region.

• PhD in physics from Nanjing University (2019)
• Postdoctoral research at Nanjing University of Science and Technology
• Current affiliation: ARCNL (since June 2021)

Zhonghui Nie's research centers on ultrafast light-matter interactions in strongly correlated materials, using advanced techniques like high harmonic generation spectroscopy. His work includes investigating photo-induced metal-insulator transitions and designing time-resolved angle-resolved photoelectron emission spectroscopy (TR-ARPES) systems.

At ARCNL, Nie leads efforts in creating intense soft X-ray sources for nano-optics and materials science applications. His technical expertise spans lattice-electron coupling and correlated material dynamics, with implications for nanotechnology and quantum materials research.