Stefan Witte

Dr. Stefan Witte is an Associate Professor at Vrije Universiteit Amsterdam and Group Leader of the EUV Generation & Imaging group at the Advanced Research Center for Nanolithography (ARCNL), where he also heads the Metrology Department. His research focuses on coherent diffractive imaging, high-harmonic generation, and metrology for nanoscale structures, particularly in semiconductor devices. He earned his PhD (cum laude) in 2007 from Vrije Universiteit Amsterdam, followed by postdoctoral work at JILA and the University of Colorado.

Education:

• PhD (cum laude) in Physics, Vrije Universiteit Amsterdam, 2007

Research Interests: Developing non-invasive 3D imaging techniques using extreme-ultraviolet (EUV) radiation and high-harmonic sources. Key areas include ptychography, laser-driven imaging, and applications in biomedical and semiconductor metrology. His work bridges fundamental physics with applied nanotechnology.

Awards & Grants:

• ERC Starting Grant (2014)
• ERC Consolidator Grant (2019)
• NWO VICI Grant (2022)
• Principal Investigator in NWO-TTW LINX consortium (Lensless Imaging with soft-X-rays)

Labs & Teams: Leads the EUV Generation & Imaging group at ARCNL, collaborating with the Metrology Department to advance EUV-based imaging and nanoscale metrology for semiconductor innovation.