Iacopo Mochiمشاهده پروفایل
پژوهشگر
- EUV Lithography
- Nano-imaging
- X-Ray Metrology
- +۶ مورد دیگر
Iacopo Mochi is a Group Leader for Advanced Lithography and Metrology and beamline scientist at the Paul Scherrer Institute (PSI), specifically working at the Laboratory for X-ray Nanoscience and Technologies within the PSI Center for Photon Science. He has extensive experience in EUV lithography, X-ray optics, and semiconductor metrology, with a career spanning multiple prestigious research institutions including Lawrence Berkeley National Laboratory and imec. Dr. Mochi received his physics degree from the University of Florence and earned a PhD in Methods and Technologies for Environmental Monitoring. His career path has included significant contributions to LIDAR systems, astrophysical instrumentation, and ultimately EUV technologies for semiconductor manufacturing. At PSI since 2016, he has established himself as a leading researcher in advanced lithography techniques. His primary research focuses on the development of EUV instrumentation for semiconductor metrology, particularly the XIL-II metrology end station - a lensless microscope dedicated to EUV photomask inspection. His work spans nano-imaging, interferometry techniques in the X-Ray spectrum, and the characterization of advanced materials for semiconductor manufacturing. Dr. Mochi has made significant contributions to the field through the development of RESCAN, an actinic pattern inspection platform based on coherent diffraction imaging. Analysis of his publication record reveals a strong trajectory of innovation in EUV lithography, with recent work pushing resolution limits to 5 nm, developing novel metrology techniques, and applying machine learning approaches to improve image reconstruction and defect detection. His research directly addresses critical challenges in semiconductor manufacturing as the industry moves toward smaller technology nodes. Dr. Mochi's scientific contributions include groundbreaking work on EUV pellicles for mask protection, characterization of absorber and phase defects on EUV reticles, and advancements in interference lithography techniques. His collaborative research demonstrates strong partnerships with industry and academic institutions worldwide. As the beamline scientist for the XIL-II beamline, Dr. Mochi coordinates and supervises experiments that support cutting-edge research in semiconductor manufacturing and nanotechnology. His leadership extends to mentoring junior researchers and contributing to the development of next-generation scientists in the field of advanced lithography.
