معرفی
William G. Oldham is a Professor in the Department of Electrical Engineering and Computer Sciences at the University of California, Berkeley. He has held numerous leadership roles, including Director of the Electronics Research Laboratory, Director of the California SEMATECH Center of Excellence, and Director of the DARPA/SRC Research Network for Advanced Lithography. His academic career spans over four decades, with significant contributions to semiconductor manufacturing and integrated circuit design.
- PhD in Electrical Engineering (1963), MS (1961), BS (1960) from Carnegie Institute of Technology.
Professor Oldham’s research focuses on semiconductor manufacturing processes, particularly in lithography technologies for integrated circuits. His work encompasses EUV lithography, maskless patterning systems, MEMS-based microactuators, and optical analysis of semiconductor fabrication techniques. He has pioneered advancements in micromirror arrays, optical modeling, and material stability under UV exposure.
His publications highlight trends in advanced lithography, MEMS, and nanofabrication, with a strong emphasis on EUV and maskless technologies. These works bridge theoretical modeling with practical implementation in semiconductor manufacturing.
- IEEE Cledo Brunetti Award (2005)
- Berkeley Citation (2004)
- SIA University Research Award (2003)
- SRC Technical Excellence Award (1996)
- National Academy of Engineering Member (1986)
- IEEE Fellow (1981)
- Guggenheim Fellow (1985)
Professor Oldham has advised numerous researchers through collaborative publications and directed major research initiatives. His work has been supported by grants from organizations including DARPA and SRC. He is associated with the Electronics Research Laboratory and the DARPA/SRC Research Network for Advanced Lithography.
