Vadim Y. Banine

Prof. Vadim Y. Banine is a part-time Full Professor of Physics and Technology of EUV Lithography at Eindhoven University of Technology (TU/e), combining this role with his position as Director of ASML. His research focuses on EUV lithography, plasma physics, surface physics/chemistry, and accelerator technology. He holds a cum laude MSc from Moscow Institute of Physics and Technology and a PhD from TU/e (1994).

At ASML, he oversees research programs, project leadership, and global collaborations to advance EUV technology. He is a member of FOM's Scientific Advisory Committee and has over 60 patents and 40+ publications. His work contributes to UN SDGs like affordable and clean energy and industry innovation.

Recent research highlights plasma-particle interactions, EUV-induced phenomena, and sensor development for plasma diagnostics. His collaborative networks include TU/e, Twente University, and Russian ISAN. Awards include the ASML Patent Award.