Vadim Banine

Prof. Vadim Banine holds a part-time professorship in Physics and Technology of EUV Lithography at Eindhoven University of Technology (TU/e), combining this role with his position as Director at ASML. His expertise spans EUV lithography, plasma physics, and accelerator technology, with a focus on advancing semiconductor manufacturing through collaborative industry-academia research.

Education: He earned a cum laude MSc from Moscow Institute of Physics and Technology (1994) and a PhD from TU/e (1994), followed by a postdoc at TU/e's Heat and Mass Transfer Lab (1995–1996). His career at ASML includes roles from lead engineer to Director, driving research programs and global collaborations.

Research Focus: Banine's work addresses EUV lithography challenges, plasma-material interactions, and surface physics. Recent studies explore particle behavior under plasma exposure, leveraging techniques like laser light scattering and focused ion beam analysis. His contributions include over 60 patents, including the ASML Patent Award-winning innovations.

Collaborations: Active partnerships with TU/e, Twente University, and Russian ISAN support EUV lithography development. He chairs ASML's research roadmap and advises FOM's Scientific Advisory Committee.

Awards: Recognized for 60+ patents and 40+ publications, emphasizing his impact on both academic and industrial research.