TOK Eng Soon

TOK Eng Soon is an Associate Professor at the National University of Singapore (NUS), specializing in electronic materials growth and interface characterization. His research spans fundamental and applied surface science, focusing on low-dimensional structures at the atomic scale and non-destructive materials analysis for quality control in consumer products.

Education:

• PhD, Imperial College London, UK (1998)
• BSc (Hons. Physics and Chemistry), NUS, SG (1993)

Research Interests:

• Electronic Materials Growth and Interface Characterisation (eMaGIC): Growth kinetics, dynamics, and self-assembly in thin films on semiconductors
• Materials Analysis and Reliability Science (MARS): Non-destructive testing for industrial applications
• Spintronics: Electronic states in silicene and transition metal silicides
• Advanced Characterization Techniques: XPS, UPS, AFM, TEM, XRD, and more

Research Trends: His recent publications highlight interdisciplinary work in semiconductor manufacturing (e.g., VLSI interconnects), atomic-scale material behavior (e.g., CoSi2 nanowires), and emerging areas like GeSn alloys and silicene for spintronics.