معرفی
Marcel David Ackermann serves as Full Professor at the MESA+ Institute, leading the XUV Optics research group with expertise in advanced thin-film systems for extreme ultraviolet and X-ray applications. His work bridges fundamental surface science with semiconductor lithography technology through nanoscale interface engineering.
Primary research domains include Thin Films (100% fingerprint relevance), Surface Science (71%), Plasma Physics (66%), and X-ray Optics, with methodological focus on Low Energy Ion Scattering (LEIS), Transmission Electron Microscopy, and grazing emission X-ray fluorescence. Current investigations target atomic diffusion mechanisms in plasma-exposed thin films and metal oxide stabilization under reactive hydrogen environments.
Recent publications (2025) reveal concentrated efforts in EUV multilayer optimization, nanoscale interface characterization using Calcium Niobate model systems, and laboratory-based XRF waveguide analysis. This work demonstrates strong alignment with industrial semiconductor manufacturing challenges, particularly in atomic-scale interface control for next-generation lithography.
Ackermann oversees 5 supervised research projects while maintaining active scientific engagement through 29 recorded activities including 13 invited talks on EUV physics and multilayer optimization. His research group operates within the MESA+ Institute's infrastructure, leveraging specialized XUV optics facilities for thin-film characterization and development.
