Jane Chang

Jane Chang serves as Distinguished Professor and Inclusive Excellence Officer at UCLA, holding the William Frederick Seyer Endowed Chair in Materials Electrochemistry with dual appointments in Chemical and Biomolecular Engineering and Materials Science and Engineering.

Her educational background includes:

• B.S. from National Taiwan University (1993)
• M.S. from Massachusetts Institute of Technology (1995)
• Ph.D. from Massachusetts Institute of Technology (1998)

Professor Chang's research centers on plasma chemistries and surface kinetics, atomic layer deposition of complex oxides, and semiconductor processing, with significant contributions to computational surface chemistry and nanstructured complex oxides. Her experimental and computational work bridges materials science and electronic device fabrication, focusing on precision control of material interfaces for next-generation semiconductors.

Analysis of her 2008-2009 publications reveals dominant research trajectories in plasma etching mechanisms for high-k dielectrics (particularly Hf-based systems), luminescent nanomaterial development, and bio-inspired nanofabrication techniques. These works span semiconductor manufacturing, optical materials, and nanotechnology with strong emphasis on process optimization and material characterization.

Major recognitions include:

• NSF Faculty Career Award (2000-2004)
• ONR Young Investigator Award (2003)
• AVS Peter Mark Award (2005)
• Multiple UCLA teaching honors including Professor of the Year (2004, 2009)
• William F. Seyer Endowed Chair (2000-)

Her research program has been sustained through competitive grants including the NSF CAREER and ONR Young Investigator awards, supporting fundamental investigations into plasma-surface interactions and nanomaterial synthesis. Teaching excellence has been consistently recognized through departmental awards since 2002, reflecting dual commitment to research innovation and educational impact.

While specific laboratory details aren't provided, her collaborative publications indicate leadership of an active research group focused on advanced materials processing at the intersection of chemical engineering and materials science.