Helmut Schift

Dr. Helmut Schift is an academic Lecturer at the Paul Scherrer Institute (PSI) and the University of Applied Sciences and Arts Nordwestschweiz (FHNW). He leads the Advanced Nanomanufacturing (ANaM) Group within PSI's Laboratory for Nano and Quantum Technologies, focusing on nanoimprint lithography (NIL) and polymer nanotechnology. His career spans over 30 years, with key contributions to 3D surface patterning, microfluidics, and printed electronics.

His research interests center on nanoimprint lithography, 3D lithography, and polymer surface modification for applications in micro-optics, quantum chips, and printed electronics. His work bridges academic research and industrial implementation through initiatives like the INKA-PSI joint venture and the ANAXAM center.

Recent publications highlight innovations in room-temperature glass imprinting, low-cost nanofabrication, and ultrasmooth surface techniques. His research trends emphasize additive manufacturing, hybrid structuring, and scaling of NIL processes for commercial viability.

Scientific recognition includes:

• Swiss Technology Award (2005)
• Nanoimprint Pioneer Award (2016)
• EIPBN Best Journal Paper Award (2022)
• AVS Journal Most Valuable Reviewer (2016)

At PSI, he oversees the Park Innovaare Cleanrooms (PICO) and drives technology transfer via start-ups XRnanotech and INVEEL. He also completed MAS studies in Applied Ethics at the University of Zürich (2021) and serves as a Consultant on Research Integrity (30% FTE).