Eytan Barouch

Eytan Barouch is a Professor in the Department of Mechanical Engineering at Boston University. His primary research focuses on electromagnetic applications, numerical analysis, and algorithm development for industrial processes. He specializes in EUV lithography, inverse scattering techniques, and material property identification. His work often addresses challenges in microchip fabrication, pellicle deformation effects, and high-NA optical systems.

Education: PhD from Stony Brook University. His research integrates advanced computational methods with practical engineering problems, such as optimizing EUV sources and mitigating defects in lithographic systems. Notable contributions include developing fast simulators for large-area EUV lithography and analyzing waveguide effects in high-NA systems to extend 4-nm node capabilities.

His publications span over three decades, emphasizing rigorous electromagnetic simulations, pellicle impact on critical dimension uniformity, and non-linear material responses. While no specific awards are listed, his extensive body of work reflects sustained contributions to computational electromagnetics and semiconductor manufacturing.

Prof. Barouch’s advising and grants focus on advancing lithography technologies and material characterization, though specific grant details are not provided. His research group likely collaborates with semiconductor industry partners, given the applied nature of his work.