Arnaud Claudel

Arnaud Claudel is a permanent Researcher at the CNRS, affiliated with the Néel Institute and the Quantum Electronics, Surfaces and Spintronics (QUEST) department. His work bridges materials science, semiconductor growth, and quantum electronics, focusing on advanced thin-film technologies and solid-state electrochemistry.

• Doctorate in Materials Science from Grenoble INP (2009)
• MSc in Materials Science and Engineering (2006)

Claudel's research spans two major domains: (1) high-temperature chemical vapor deposition of aluminum nitride (AlN) for optoelectronic and semiconductor applications, and (2) graphene-based biohybrid nanoelectronics for sensing. His recent work in 2D materials explores strain engineering in bilayer graphene and graphene FETs for ion-channel receptor sensing, integrating nanofluidics and neuroengineering.

Earlier contributions centered on AlN growth via HTCVD and HVPE, examining nucleation layers, gas-phase stoichiometry, and process optimization. His publications cover thin film characterization, epitaxial growth mechanisms, and surface science in semiconductor contexts.

Current projects involve hybrid graphene-microfluidic platforms for neuronal interfacing, reflecting his interdisciplinary focus on materials for quantum technologies and bioelectronic systems. No scientific awards are explicitly mentioned in the provided data.

Claudel collaborates with teams across materials synthesis and device physics, including Nanoscale and Advanced Functional Materials co-authors. His technical expertise spans chemical vapor deposition, thin-film analysis, and microfabrication of semiconductor devices.