معرفی
Qi Hua Fan is a Professor at Michigan State University, jointly appointed in the Department of Electrical and Computer Engineering (ECE) and Chemical Engineering & Materials Science (ChEMS) within the College of Engineering. He leads the Plasma Sources and Processing Lab, focusing on plasma science, materials processing, and energy storage technologies. His research includes plasma sources for coatings, nanostructured materials for energy applications, and environmental remediation. He holds a Ph.D. in Applied Physics from the University of Aveiro (1999).
Education:
- Ph.D., Applied Physics, University of Aveiro, 1999
Research Interests: Plasma sources, plasma-material interactions, thin film solar cells, supercapacitors, optical thin films, functional coatings, and environmental nanomaterials like plasma-activated biochar for PFAS treatment.
Key Awards:
- Cannon Intellectual Property Commercialization Award (2012-2013)
- Distinguished Researcher Award (2013-2014)
- Best Paper Award (IEEE EIT Conference, 2013)
Notable grants include NSF funding (2019) and a DOE Advanced Manufacturing Award (2018). He advises multiple doctoral and master’s students, listed in detail above.
Labs & Collaborations: Director of the Plasma Sources and Processing Lab, collaborating with the Fraunhofer Center for Coatings and Diamond Technologies. Research spans plasma reactors, nanostructured composites, and energy storage devices.
