معرفی
Marko Yli-Koski is a researcher at the Department of Electronics and Nanoengineering, Aalto University. His work focuses on semiconductor physics, silicon photodetectors, and surface recombination control through advanced fabrication techniques.
- Role: Full Researcher
- Research Themes: Germanium interface engineering, atomic layer deposition, black silicon technology, and optoelectronic device characterization
- Collaborations: Active in Hele Savin Group with interdisciplinary team members
Research Interests span semiconductor manufacturing innovations, including:
- Metal-Assisted Chemical Etching (MACE) for nanostructuring
- Plasma-enhanced atomic layer deposition of dielectric films
- Surface passivation techniques for silicon and germanium substrates
- Photoluminescence imaging for wafer-level characterization
- Black silicon applications in solar cells and photodetectors
Scientific Contributions include 10+ publications (2020–2023) in journals like J. Phys. Chem. C, Appl. Phys. Lett., and IEEE Transactions series, demonstrating expertise in:
- Carrier dynamics in semiconductor materials
- Defect density reduction at heterointerfaces
- Light-induced degradation mechanisms
- Surface recombination velocity optimization
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