معرفی
Jon Ihlefeld is a Professor in the Materials Science and Engineering and Electrical and Computer Engineering Departments at the University of Virginia. He joined UVA in 2017 as an Associate Professor after a career at Sandia National Laboratories. His research focuses on thin film ferroelectrics, dielectrics, and ion-conducting oxides. He is actively involved in editorial roles for journals such as the Journal of the American Ceramic Society and IEEE Ferroelectrics.
Education
- B.S., Materials Engineering, Iowa State University, 2002
- M.M.S.E., North Carolina State University, 2005
- Ph.D., Materials Science and Engineering, North Carolina State University, 2006
- Post-Doc, Pennsylvania State University, 2006–2008
Research Interests
Dr. Ihlefeld's work spans ferroelectric materials, dielectric integration, and thermal transport in thin films. He explores novel processing techniques such as atomic layer deposition and sputtering to control material properties, with applications in energy storage and electronic devices.
Notable Awards
- Fellow of The American Ceramic Society (2023)
- DARPA Young Faculty Award (2020)
- Richard M. Fulrath Award (2017)
- R&D 100 Awards (2017, 2010)
Grants & Advising
His grants focus on ferroelectric thin film integration and energy storage materials. He has advised numerous students and mentored postdocs, though specific student names are not listed here.
Labs & Teams
He leads the Multifunctional Thin Film Group at UVA, collaborating with national labs and industry to advance materials for next-generation electronics and energy systems.
