Daniel Lundin

Daniel Lundin is a Senior Associate Professor and Head of Unit at Linköping University's Department of Physics, Chemistry and Biology, where he leads the Thin Film Physics (TUNNF) division. He also holds a Guest Professor position in the Coatings & Plasma Physics Division. Lundin earned his Ph.D. from Linköping University in 2010 and has conducted research at the Royal Institute of Technology (KTH), Kiel University (Germany), and CNRS/Paris-Saclay University (France). He is the co-founder of Ionautics, a Swedish thin film technology company.

Lundin's research focuses on plasma discharge development and characterization, particularly High Power Impulse Magnetron Sputtering (HiPIMS). His current investigations include:

• Plasma process control for reactive gas deposition (oxygen/nitrogen)
• Non-invasive real-time plasma diagnostics
• Digitalization of deposition processes for Industry 4.0 integration
• Ionized flux control for enhanced thin film properties

His publications demonstrate a consistent focus on plasma discharge optimization, thin film deposition mechanisms, and advanced materials characterization. Recent work emphasizes process control, plasma diagnostics, and the development of high-performance functional coatings for industrial applications.

Awards and recognitions:

• Author of the first comprehensive book on HiPIMS (Elsevier, 2020)
• IOP Trusted Reviewer recognition
• Winner of Mentor4Research award

Lundin leads research in plasma physics and thin film technology at Linköping University, driving innovations in deposition techniques while collaborating with industry through Ionautics. His work bridges fundamental plasma physics with industrial thin film applications.