Daniel Loch

Dr Daniel Loch is a Postdoctoral Researcher at the Materials and Engineering Research Institute, Sheffield Hallam University. He holds a PhD in Plasma Science and Materials Engineering (2015) from the National HIPIMS Technology Centre and a Diplom-Ingenieur (FH) in Mechatronics from Jade University of Applied Sciences (2009). His research focuses on advanced plasma-based thin film deposition techniques such as Inductively Coupled Impulse Sputtering (ICIS) and HIPIMS, particularly for magnetic coatings and high-aspect-ratio structures in MagMEMS devices and sensors. He has developed novel sputtering techniques and characterized plasma properties using tools like Plasma Sampling Mass Spectroscopy and Scanning Electron Microscopy. In 2016, he won the Joint SHU-Fraunhofer IST Research Centre Award for his work on ICIS processes.

His research areas include highly ionized plasma technology, magnetic thin films, and electrically insulating coatings. He has contributed to studies on thin film deposition for photovoltaic applications, semiconductor-compatible materials, and biomedical alloy coatings. Daniel has published extensively on HIPIMS, ICIS, and plasma nitriding processes, with notable work on transition-metal nitrides and nanocomposite coatings.

His recent publications (2012–2025) highlight advancements in plasma-based deposition methods, including reverse pulse strategies for silicon dioxide coatings and CMOS-compatible plasmonic films. His research emphasizes practical applications in electronics, biomedical engineering, and optoelectronics, leveraging cutting-edge plasma analysis and thin film characterization techniques.