Arie den Boef

Prof. Arie den Boef is an Endowed Professor in the Faculty of Science at Vrije Universiteit Amsterdam, affiliated with the LaserLaB - Physics of Light department. He holds a secondary role as a Medewerker at ASML (2021–2027) and is involved with CIOMP in Changchun. His research focuses on nanolithography, advanced optics, and precision metrology, contributing to UN Sustainable Development Goals related to industry and innovation.

His work bridges fundamental physics with applied nanotechnology, particularly in semiconductor manufacturing. Key research areas include holographic microscopy for overlay metrology, metasurface engineering for nanoscale applications, and vibration mitigation in optical systems. He has collaborated internationally on projects involving nanometer-scale feature analysis and dielectric material characterization.

Prof. den Boef has published 22 peer-reviewed articles since 2020, with recent work exploring topics like Berry phase metasurfaces and Fourier transform spectrometers. His research emphasizes precision measurement techniques critical to semiconductor fabrication and nanoscale device development.

He currently supervises PhD research in advanced metrology and nanophotonics, and his lab (LaserLaB) focuses on interdisciplinary light-based technologies. No scientific awards are explicitly listed, but his work has been widely shared on platforms like Mendeley.