Mike van de Poll

Mike van de Poll is a Researcher at Eindhoven University of Technology, affiliated with the Plasma & Materials Processing group. His work focuses on advancing spatial Atomic Layer Deposition (ALD) for high-volume manufacturing applications like solar cells and batteries, under the supervision of Erwin Kessels and Bart Macco. Key collaborations include partnerships with Chipmetrics to optimize ALD processes using their PillarHall test chips.

• General Research Areas:
  • Atomic Layer Deposition
  • Plasma Processing
  • Material Science
  • Thin Film Technology
  • Semiconductor Manufacturing

Van de Poll’s research investigates the impact of atmospheric pressure on ALD conformality, oxygen radical recombination dynamics in high-aspect-ratio structures, and transitions between amorphous and crystalline phases in titanium oxide films. His studies compare co-dosing and supercycle methods for ternary oxide deposition, emphasizing precise precursor management.

His publications demonstrate the utility of PillarHall test chips in quantifying film growth mechanisms, radical diffusion, and the influence of energetic particles (ions, UV photons) in plasma processes. These insights are critical for optimizing ALD in industries such as solar cells and battery manufacturing.

Van de Poll envisions widespread adoption of spatial ALD in industrial applications, with startups already leveraging the technology for battery electrode coatings. His work bridges fundamental research on ALD mechanisms with practical implementation in scalable manufacturing systems.