Henrik Pedersen

Henrik Pedersen is a Professor of Inorganic Chemistry at the Department of Physics, Chemistry and Biology (IFM), Linköping University. He leads the Pedersen Group, which focuses on Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) processes for advanced materials. His research integrates chemistry, physics, and materials science, emphasizing sustainable thin film deposition techniques and applications in electronics, neutron detection, and surface engineering.

Education: M.Sc. in Chemistry (2004) and Ph.D. in Materials Science (2008), both from Linköping University. Post-industrial research at Sandvik Tooling (2009–2010), followed by an academic career. Visiting Professor at Carleton University (2016).

Research Interests: CVD/ALD of electronic materials, plasma-driven surface chemistry, boron-based materials (e.g., B4C for neutron detectors), and ALD of group-13 nitrides. Collaborates with experts in quantum chemistry, plasma physics, and materials science.

Articles Trends: Recent work emphasizes ALD process optimization, plasma electron utilization, and boron carbide applications. Key themes include conformal coatings, surface reaction kinetics, and material defect reduction. Over 30 peer-reviewed publications since 2020, with contributions to Nature Communications, Journal of Vacuum Science & Technology A, and Nanoscale.

Advising & Labs: Supervises PhD students (e.g., Pamburayi Mpofu, Issa Nseir) and postdoctoral researchers. Manages the Pedersen Group, a multidisciplinary team exploring CVD innovations. Active in grants from WASP-WISE and collaborations with the European Spallation Source (ESS).

Labs/Teams: Pedersen Group at Linköping University, with projects on plasma-assisted metal deposition, neutron converter layers, and sustainable CVD processes.