Prof. Karen K. Gleason is a leading academic in chemical engineering and materials science at the Massachusetts Institute of Technology (MIT). She holds a Ph.D. from the University of California at Berkeley (1987) and dual degrees from MIT (S.B. and S.M., 1982). Her research focuses on chemical vapor deposition (CVD), membranes, organic surfaces, and device fabrication, with a strong emphasis on applications in energy, electronics, and environmental sustainability. Her awards include the AIChE's Margaret Hutchinson Rousseau Pioneer Award (2021), election to the National Academy of Engineering (2015), and numerous fellowships and recognitions for her pioneering work in polymer science and CVD technologies. She has also contributed to initiatives like the Gordon Conferences and international conferences in materials science. Gleason's research explores nanoscale control of polymer films, supercapacitors, flexible electronics, and anti-fouling coatings. Her work bridges fundamental chemical engineering principles with practical applications in energy storage, solar cells, and advanced manufacturing. Key innovations include oxidative CVD (oCVD) and initiated CVD (iCVD) techniques for creating functional polymer surfaces. Her publications span over three decades, addressing topics such as conductive polymers, nanomaterials, and scalable manufacturing processes. She has also led teams in developing anti-scaling coatings for desalination plants and high-performance thin films for electronics.
