معرفی
Sean M. Casey is the Associate Dean of the College of Science at the University of Nevada, Reno, and an Associate Professor of Chemistry. He oversees academic and student programs, including WiSE and NevadaTeach, collaborating with department chairs and leadership to support curriculum and assessment efforts. His research focuses on semiconductor materials growth mechanisms during plasma-enhanced chemical vapor deposition (PECVD), using hyperthermal beams of reactive species to study surface interactions in ultrahigh vacuum environments. Techniques include mass spectrometry, low-energy electron diffraction, and Auger electron spectroscopy.
- Education:
- Ph.D. in Chemistry, 1993, University of Minnesota (Advisor: Doreen G. Leopold)
- B.S. in Chemistry, 1988, State University of New York, College at Purchase
- Postdoctoral Fellowships: NRC-NIST (1993–1995) and JILA, University of Colorado (1995–1997)
Research interests include heteroepitaxial growth of lattice-mismatched materials like Ge/Si and SiC/Si, with a focus on fundamental heterogeneous reactions during material synthesis. His work addresses critical challenges in semiconductor technology, such as improving material integrity and scalability.
Publications span over two decades, emphasizing surface chemistry, liquid-crystalline materials, and semiconductor growth mechanisms. Key topics include molecular design for polarizing materials, adsorption dynamics on silicon surfaces, and photoluminescent film development.
Though no specific grants or awards are listed, his extensive publication record reflects sustained contributions to materials science and surface chemistry.
His laboratory employs advanced spectroscopic techniques to study ion-surface interactions, contributing to the understanding of plasma processes critical for semiconductor manufacturing.
