معرفی
Ralf Peter Brinkmann is a Professor and Chair holder of Theoretical Electrical Engineering at Ruhr University Bochum, Faculty of Electrical Engineering and Information Technology, since 2000. He is actively involved in research as a member of the Center for Plasma Science and Technology and a board member of the Collaborative Research Centre 591 ("Universal Behaviour of Non-Equilibrium Plasmas: Heating, Transport, and Structure Formation") since 2003. His office is located at Room ID 1/127, Universitätsstraße 150, D-44801 Bochum, with contact via brinkmann@tet.rub.de.
His educational background includes:
- Diploma in Physics (1984) from Ruhr-University Bochum
- Diploma in Electrical Engineering (1985) from Ruhr-University Bochum
- PhD (Dr. rer. nat.) in theoretical astrophysics (1986) from Ruhr-University Bochum
Brinkmann's research centers on low-temperature plasma physics, specifically modeling and simulation of technical plasmas, theory of plasma edge layers, and model-based plasma diagnostics. He investigates electron dynamics, power absorption mechanisms, and sheath behavior in capacitive coupled radio frequency discharges, magnetron plasmas, and atmospheric pressure plasma jets, with focus on kinetic effects and electromagnetic phenomena.
Analysis of his recent publications (2023-2025) reveals strong emphasis on electromagnetic particle-in-cell simulations, time-resolved plasma transition studies (E-H, capacitive-inductive), and thermodynamic quasi-equilibria in high-power magnetrons. Key trends include rotational spoke dynamics in ExB plasmas, nonlocal electron transport, and diagnostic tools like the multipole resonance probe.
Scientific awards:
- No scientific awards listed for Brinkmann in the provided text
Brinkmann has advised PhD and Master's students (specific names unlisted) and secured major research funding through Collaborative Research Centre 591 under the German Research Foundation. His work includes industry collaborations with Siemens AG/Infineon Technologies and academic partnerships with Stanford University, University of Chicago, and Old Dominion University.
He leads research within the Center for Plasma Science and Technology and Collaborative Research Centre 591, developing advanced plasma models and diagnostic probes. His team focuses on computational frameworks for plasma edge layers, magnetron discharge kinetics, and industrial plasma process optimization, particularly for semiconductor and thin-film applications.
