DAMIEN AUREAU

Damien Aureau is a Researcher at the Lavoisier Institute of Versailles (ILV), part of the University of Versailles Saint-Quentin-en-Yvelines. He holds a CNRS research fellowship since 2011 and focuses on semiconductor functionalization, oxide modifications, and ion bombardment effects on thin films including 2D materials. His academic background includes a PhD from the Ecole Polytechnique (2005-2008), a postdoc at the University of Texas (2009-2010), and engineering studies at the National School of Chemistry of Paris.

Research interests emphasize advanced material science applications with particular attention to nanotechnology interfaces. His work bridges chemistry and engineering disciplines.