معرفی
Ching-Lien Hsiao is an Associate Professor (Docent) at the Department of Physics, Chemistry and Biology (IFM), Linköping University. His research focuses on the development of electronic-grade III-nitride semiconductor thin films and nanostructures using magnetron sputter epitaxy for industrial applications in chiroptical elements, electronics, and optoelectronics.
- PhD in Physics from National Sun Yat-Sen University, Taiwan (2004)
- Postdoctoral research at National Taiwan University (2004-2008)
- Current appointments: Associate Professor at IFM, Linköping University
His work spans the synthesis and characterization of AlN, GaN, and InN materials, with a particular emphasis on understanding atomic-scale processes during film growth. Research applications include high-power electronic devices, optical elements, and quantum technologies.
Scientific funding includes support from the Swedish Research Council, Swedish Energy Agency, Olle Engkvist Foundation, and STINT. Recent publications highlight advancements in gallium oxide devices, tantalum nitride growth mechanisms, and magnetron sputtering techniques for semiconductor applications.
- Key Awards:
- Outstanding Postdoc Fellowship, National Science Council, Taiwan (2008)
