Martin John Neumann
Adjunct Assistant Professor · EUV Lithography Technologies
University of Illinois Urbana-ChampaignAbout
Martin John Neumann is an Adjunct Assistant Professor in the Department of Nuclear, Plasma & Radiological Engineering at the University of Illinois Urbana-Champaign (UIUC), within The Grainger College of Engineering. He holds a Ph.D. (2007), M.S. (2004), and B.S. (1999) in Nuclear Engineering from UIUC, along with a Post-Baccalaureate Premedical Certificate from the University of Pennsylvania (2000). His research focuses on EUV lithography technologies, semiconductor fabrication processes, plasma-material interactions in fusion contexts, and advanced materials engineering for nuclear applications. Neumann has been affiliated with UIUC since 1996, including roles as a Postdoctoral Research Associate (2007–2009) and Undergraduate Research Assistant (1996–1999). He also worked at Motorola’s Semiconductor Product Sector in 1998 and Georgia Institute of Technology in 1997.
His scholarly work includes publications on EUV collector optics performance, Gibbsian segregating alloys, and lithium-based material systems. Neumann has received the UIUC Alumni Association Loyalty Award and the Institute for Nuclear Safety Scholarship, and is affiliated with professional organizations like SPIE and the American Medical Association. He is based at Suite 100 Talbot Laboratory, contributing to research in plasma and fusion engineering, radiological applications, and nuclear safety.
Advising and grants: No formal advisees (PhD/Master’s students) are explicitly listed in the provided information. His professional experience includes roles where he likely advised junior researchers, but specific student names are not mentioned. No grants are detailed here, but his postdoctoral and research positions suggest institutional funding support.
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