Martijn ML Reitsma

Martijn ML Reitsma is a postdoctoral researcher at the Advanced Research Center for Nanolithography (ARCNL) in the EUV Plasma Processes group since August 2024. He previously obtained his MSc (2020) and PhD (2024) in Theoretical Physics from the University of Groningen, Netherlands, where he was affiliated with the van Swinderen Institute’s Atoms, Ions and Molecules group.

• Education:
  • MSc in Theoretical Physics, University of Groningen (2020)
  • PhD in Theoretical Physics, University of Groningen (2024)

Research Focus: Martijn’s work centers on theoretical atomic physics, computational methods, and plasma processes. His PhD research utilized ab initio electronic structure calculations to study atomic energies, hyperfine structures, and isotope shifts, contributing to nuclear moment evaluations and relativistic basis set development. Currently, he investigates the electronic structure underlying 13.5 nm EUV light emission in laser-driven tin plasmas at ARCNL, supporting nanolithography advancements.

Current Role: At ARCNL, Martijn collaborates with Oscar Versolato’s Plasma Theory and Modeling team to unravel fundamental plasma dynamics for EUV light generation, combining his expertise in atomic structure with applications in applied physics and materials science.