
Jung-Hoon Chun
Professor · Chemical-Mechanical Polishing
Massachusetts Institute of TechnologyAbout
Professor Jung-Hoon Chun is a faculty member at the Massachusetts Institute of Technology (MIT) in the Department of Mechanical Engineering. His research focuses on advanced manufacturing processes, particularly chemical-mechanical polishing (CMP), precision droplet generation, and continuous pharmaceutical manufacturing. He also explores the intersection of technology multipliers in manufacturing systems.
- Education: B.Sc. in Mechanical Engineering (1976), M.Sc. in Mechanical Engineering (1980), Ph.D. in Mechanical Engineering (1984)
Research interests span semiconductor manufacturing, microstructure optimization, and droplet dynamics. His work has led to patents in droplet control, photoresist coating, and gamma-ray interface detection. Key publications analyze CMP mechanics, spray deposition, and droplet-solid interactions.
Notable scientific awards include the Ruth and Joel Spira Award for Distinguished Teaching (1996), Edgerton Career Development Chair (1991-1997), and Fellowship in the International Academy for Production Engineering Research (2005). He serves as Faculty Director of the MISTI MIT-Korea Program and Director of the Laboratory for Manufacturing and Productivity.
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