
About
Erwin Kessels is a Full Professor at the Department of Applied Physics at Eindhoven University of Technology (TU/e). He serves as Scientific Director of the NanoLab@TU/e, managing open-access nanotechnology facilities. His research focuses on atomic scale processing, particularly plasma-assisted atomic layer deposition (ALD) for applications in photovoltaics and nanoelectronics. He has pioneered advancements in area-selective ALD and nanopatterning techniques.
Education: MSc (1996) and PhD (2000) in Applied Physics from TU/e. Postdoctoral affiliations included Colorado State University and Philipps University Marburg. Served as visiting professor at Ruhr University Bochum (2019–present). Key roles include chairing international ALD conferences (2008, 2020) and leading the Dutch Vacuum Society as president. Editor-in-Chief of the Journal of Vacuum Science & Technology A/B.
Research impact includes over 300 publications, 100+ invited talks, and 4 patents. Notable awards: Peter Mark Memorial Award (2007), NWO Vici Grant (2010), ALD Innovator Award (2019). Founder of ALD Academy and AtomicLimits.com blog.
Current activities include organizing ALD workshops, advising through Atomic Limits Training & Consulting, and serving on NanoLabNL's board. His work bridges nanoscience with industrial applications, emphasizing quantum technology and energy systems.
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